Deionized water drying lamp

Mon, 08 Jun 2026 04:54:22 +0800

On a 300mm line, one water mark after cleaning is enough to kill an entire lot. We built the Deionized Water Drying Lamp to kill that failure mode, giving you controlled evaporation with no film residue and no particle excursions. What matters, technically The lamp packs short-wave infrared emitters into a sealed, cleanroom-compatible housing. It heats the wafer surface directly, so you bypass the lag that comes with convection. Temperature uniformity across the wafer holds at ±0.1°C, and setpoint repeatability lands at ±0.2°C across 10,000+ bake cycles. Cold start to a stable bake profile happens in under 30 seconds, and it runs with zero particle generation verified against ISO Class 1–100 baselines. The system is built for 24/7 duty, with predictive thermal feedback that keeps output drift under 5% over 5,000 hours. Why it works in real process steps In post-clean drying and in photoresist bake steps, the lamp protects your thermal budget by avoiding overshoot—overshoot that can drive TTOP thinning or foot profile shifts. You end up with tighter CD control and fewer reworks on both soft bake and hard bake, while you cut energy use compared to running full-chamber bake plates. You get higher throughput with a wider process window, and you stop throwing away lots because of residual water marks. What you need to plan for The lamp needs cleanroom-grade mounting and a dedicated, filtered power feed to keep thermal stability where it should be. It’s optimized for 150/200/300mm wafers. Retrofit kits cover most track platforms, but if you’re tying into legacy ovens, you may need a custom fixture to align the irradiation field. Plan a short qualification run to lock in your bake profile and confirm particle performance against your baseline.

Deionized on Eco-Friendly Infrared Heating

Deionized water drying lamp